Desktop RF Sputtering Device 'SVC-700RFIII'
Equipped with three sources of cathodes in a compact tabletop size. It is also possible to produce insulating thin films, oxide, and nitride thin films.
The "SVC-700RFIII" is a compact RF magnetron sputtering device that can be placed on a desk, equipped with three φ2-inch cathodes. It is capable of forming stacked films using three types of targets. It can be expanded with a gas introduction mechanism, allowing for the introduction of up to three types of gases, including argon gas. In addition to metal thin films, it can accommodate the production of various thin films such as insulating films, oxides, and nitrides. 【Features】 ■ Desktop size for research and development ■ Sample size: up to φ2 inches ■ Additional film thickness sensor available *For more details, please refer to the documentation. Feel free to contact us with any inquiries.
- Company：サンユー電子
- Price：5 million yen-10 million yen
